Metal Alloy High Purity Titanium Sputtering Target

About Metal Alloy High Purity Titanium Sputtering Target:

Standard:
ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911

Properties:
Titanium sputtering target is made of titanium metal, which is recognized for its high strength-to-weight ratio. It is a strong metal with low density that is quite ductile (especially in an oxygen-free environment), lustrous, and metallic-white in color. The relatively high melting point (more than 1,650 °C or 3,000 °F) makes it useful as a refractory metal. It is paramagnetic and has fairly low electrical and thermal conductivity.

Application:
mainly used for integrated circuit, DRAMS and flat panel display application.

Payment & Transportation:

Metal Alloy High Purity Titanium Sputtering Target Properties

Other Names Titanium sputtering target
CAS No. N/A
Compound Formula Ti
Molecular Weight N/A
Appearance N/A
Melting Point N/A
Solubility in water N/A
Density N/A
Purity 99.6%
Size customized
Boling point N/A
Specific Heat N/A
Thermal Conductivity N/A
Thermal Expansion N/A
Young's Modulus N/A
Exact Mass N/A
Monoisotopic Mass N/A
   
   

Metal Alloy High Purity Titanium Sputtering Target Health & Safety Information

Safety Warning N/A
Hazard Statements N/A
Flashing point N/A
Hazard Codes N/A
Risk Codes N/A
Safety Statements N/A
RTECS Number N/A
Transport Information N/A
WGK Germany N/A

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